Ashable hard mask

From WikiCover

On June 25, 2007, Novellus Systems announced that it has started production shipments of its new ashable hard mask (AHM) process technology on the VECTOR Express plasma-enhanced chemical vapor deposition (PECVD) platform. Designed to address the challenges in advanced technology nodes that utilize 193nm lithography for high aspect patterning etch, where thinning photo-resist material makes it difficult to extend conventional patterning, AHM on VECTOR Express represents a major technical breakthrough compared to conventional amorphous carbon film processing. Novellus has already delivered tools with this new capability to major memory manufacturers and has commitments for shipments to additional customers within the next quarter.

Developed with a unique chemistry and enhanced plasma capability, the AHM film uniquely satisfies the demanding etch selectivity requirements of advanced device nodes while maintaining transparency to the light source used for wafer alignment during photo-resist exposure. In key customer evaluations, AHM on VECTOR Express has demonstrated superior film performance, excellent CD control, low defectivity and improved device yield. This technical performance has been achieved while reducing cost-of-ownership more than 30 percent from prevailing industry benchmarks.

In addition, a new post-deposition edge bevel film removal capability has been integrated on the VECTOR Express platform to provide process flexibility and to resolve reliability, throughput and defect performance issues associated with conventional in-chamber edge exclusion techniques. It also improves the precision and repeatability of film removal at the wafer edge, which is becoming even more important with 193nm immersion lithography.