Vector PECVD

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Introduced by Novellus Systems in 2000, VECTOR revolutionized the 300 mm PECVD market. The industry-leading system is capable of depositing all dielectric films required for advanced dual damascene structures, and is the production tool of choice with the largest installed base of 300mm systems. The tool's simple design ensures high system reliability and uptime. With two-thirds the footprint of the nearest competing tool, it offers significant lab floor space savings.

The VECTOR Express PECVD platform, introduced early in 2007, is used to deposit a variety of films for memory and logic devices. VECTOR Express delivers industry-leading productivity and fundamental thin film process improvement with its SmartSoak processing feature. SmartSoak takes advantage of the VECTOR platform's multi-station sequential processing (MSSP) architecture to control wafer heat-up independently from film deposition. This enables a more stable and consistent wafer temperature at the start of film deposition while simultaneously reducing thin film processing time.